Oxidative Removal of Implanted Photoresists and Barrier Metals in Semiconductor Processing

Oxidative Removal of Implanted Photoresists and Barrier Metals in Semiconductor Processing

Chemical systems containing oxidants are widely used at various stages in semiconductor processing, particularly for wet cleaning and polishing applications. This dissertation presents a series of studies related to oxidative removal of materials in the Front-End-Of-Line (FEOL) and Chemical Mechanic...

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Bibliographic Details
Main Author: Govindarajan, Rajkumar
Other Authors: Raghavan, Srini
Language:en
Published: The University of Arizona. 2012
Subjects:
FEOL
Galvanic Corrosion
HDIS
Semicondutor Processing
Materials Science & Engineering
BEOL
ECMP
Online Access:http://hdl.handle.net/10150/217074

Internet

http://hdl.handle.net/10150/217074

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