Wear and Contact Phenomena in Existing and Future Large-Scale Chemical Mechanical Planarization Processes
This dissertation presents a series of studies with regards to wear and contact phenomena in existing and future large-scale chemical mechanical planarization (CMP). They are also evaluated with the purposes of reducing cost of ownership (COO) and minimizing environmental impacts. The first study is...
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| Language: | en |
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The University of Arizona.
2012
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| Online Access: | http://hdl.handle.net/10150/223313 |