Rinsing Of Wafers After Wet Processing: Simulation And Experiments
In semiconductor manufacturing, a large amount (50 billion gallons for US semiconductor fabrication plants in 2006) of ultrapure water (UPW) is used to rinse wafers after wet chemical processing to remove ionic contaminants on surfaces. Of great concern are the contaminants left in narrow (tens of n...
| Main Author: | |
|---|---|
| Other Authors: | |
| Language: | en_US |
| Published: |
The University of Arizona.
2015
|
| Subjects: | |
| Online Access: | http://hdl.handle.net/10150/578724 |