Acoustic characterization of two megasonic devices for photomask cleaning

Acoustic characterization of two megasonic devices for photomask cleaning

Wet photomask cleaning relies on megasonic agitation to enhance the process, but there are many challenges to reliably maximize particle removal efficiency (PRE) and minimize damage. With the shift to pellicle-free EUV masks, photomask processes are more vulnerable to contamination, increasing the u...

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Bibliographic Details
Main Authors: Zanelli, Claudio, Giridhar, Dushyanth, Keswani, Manish, Okada, Nagaya, Hsu, Jyhwei, Yam, Petrie
Other Authors: Univ Arizona
Language:en
Published: SPIE-INT SOC OPTICAL ENGINEERING 2016
Online Access:Claudio Zanelli ; Dushyanth Giridhar ; Manish Keswani ; Nagaya Okada ; Jyhwei Hsu and Petrie Yam " Acoustic characterization of two megasonic devices for photomask cleaning ", Proc. SPIE 9985, Photomask Technology 2016, 998524 (October 5, 2016); doi:10.1117/12.2243124; http://dx.doi.org/10.1117/12.2243124
http://hdl.handle.net/10150/622537
http://arizona.openrepository.com/arizona/handle/10150/622537

Internet

Claudio Zanelli ; Dushyanth Giridhar ; Manish Keswani ; Nagaya Okada ; Jyhwei Hsu and Petrie Yam " Acoustic characterization of two megasonic devices for photomask cleaning ", Proc. SPIE 9985, Photomask Technology 2016, 998524 (October 5, 2016); doi:10.1117/12.2243124; http://dx.doi.org/10.1117/12.2243124
http://hdl.handle.net/10150/622537
http://arizona.openrepository.com/arizona/handle/10150/622537

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