Reaction of aqueous ammonium sulfide on SiGe 25%
SiGe 25% substrates were treated with aqueous solutions of ammonium sulfide with and without added acid to understand the adsorption of sulfur on the surface. X-ray photoelectron spectroscopy showed no sulfide layer was deposited from aqueous (NH4)(2)S alone and instead both Si and Ge oxides formed...
| Main Authors: | , , |
|---|---|
| Other Authors: | |
| Language: | en |
| Published: |
A V S AMER INST PHYSICS
2017
|
| Subjects: | |
| Online Access: | http://hdl.handle.net/10150/624395 http://arizona.openrepository.com/arizona/handle/10150/624395 |