Characterization of Plasma-Enhanced Atomic Layer Deposited Ga2O3 using Ga(acac)3 On GaN

abstract: This research has studied remote plasma enhanced atomic layer deposited Ga2O3 thin films with gallium acetylacetonate (Ga(acac)3) as Ga precursor and remote inductively coupled oxygen plasma as oxidizer. The Ga2O3 thin films were mainly considered as passivation layers on GaN. Growth condi...

Full description

Bibliographic Details
Other Authors: Hao, Mei (Author)
Format: Doctoral Thesis
Language:English
Published: 2018
Subjects:
Online Access:http://hdl.handle.net/2286/R.I.49373