The flame assisted chemical vapour deposition of anti-microbial thin-films and transparent conducting oxides
Flame Assisted Chemical Vapour Deposition (FACVD) is an inexpensive and robust method of producing a wide range of metal and metal-oxide films. The work presented shows this method's ability to deposit durable, semi-transparent anti- microbial films which show large reductions in the number of...
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University of Salford
2009
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| Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.517594 |