Plasma enhanced chemical vapour deposition of silica thin films
Atmospheric pressure chemical vapour deposition is an industrially significant process for forming functional thin films. There is a great opportunity for increased scientific understanding with the aim of improving current processes and helping to formulate new ones. This work is concerned with dev...
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University of Manchester
2011
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| Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.549035 |