An investigation of the electrical resistance of thin films of rare earth metals
Measurements have been made of the electrical resistivity in the film plane of rare earth metal films over a thickness range of 130 A to 250O A. The films are deposited onto glass substrates by high vacuum evaporation at pressures better than 10(^-6) torr and are protected by an over coating of sili...
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Durham University
1969
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| Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.585890 |