High-K gate oxides and metal gate materials for future complementary metal-oxide-semiconductor field-effect transistors

Similar Items

• High-K gate oxides for future complementary metal-oxide-semiconductor transistors
  by: Liu, Dameng
  Published: (2009)
• High-K metal oxides as a transistor gate insulator
  by: Peacock, Paul William
  Published: (2004)
• High-κ dielectric constant oxide and metal gate materials for future CMOS integrated circuits
  by: Wang, Lin
  Published: (2010)
• Study of Enhancement-Mode GaAs Metal-Oxide-Semiconductor Field-Effect Transistors with High-K Gate Oxides
  by: Ho-Cheng Tang, et al.
  Published: (2009)
• Design and Study of the Multi-Split-Gate Metal Oxide Semiconductor Field Effect Transistors
  by: PAN, AN-CHING, et al.
  Published: (2019)