Phosphorus activation and diffusion in germanium
Currently, the International Technology Roadmap for Semiconductors (ITRS) is targeting the 22nm technology node in accordance with Moore’s Law. The low mobility of silicon makes it inherently unsuitable as a channel material for devices at this scale, and therefore a significant amount of research i...
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University of Surrey
2015
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| Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.644902 |