Computer simulation of electromigration in microelectronics interconnect

Electromigration (EM) is a phenomenon that occurs in metal conductor carrying high density electric current. EM causes voids and hillocks that may lead to open or short circuits in electronic devices. Avoiding these failures therefore is a major challenge in semiconductor device and packaging design...

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Bibliographic Details
Main Author: Zhu, Xiaoxin
Other Authors: Lu, Hua; Bailey, Christopher
Published: University of Greenwich 2014
Subjects:
Online Access:http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.646802