Nanofabrication of silicon nanowires and nanoelectronic transistors
This project developed a robust and reliable process to pattern < 5 nm features in negative tone Hydrogen silsesquioxane (HSQ) resist using high resolution electron beam lithography and developed a low damage reactive ion etch (RIE) process to fabricate silicon nanowires on degenerately doped n-t...
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University of Glasgow
2015
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| Online Access: | http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.656243 |