The development of molecular precursors for the atomic layer deposition of tin monoxide and related studies
The development of p-type metal oxide materials is of great importance and is seen as an enabling factor in next-generation electronic devices. Consequently, the formulation of reliable techniques for the deposition of these materials is of significant interest, though precursor chemistry towards th...
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University of Bath
2019
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| Online Access: | https://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.767599 |