Distortion in conformable masks for evanescent near field optical lithography
In this thesis the in-plane pattern distortion resulting from the use of Evanescent Near Field Optical Lithography (ENFOL) masks was investigated. ENFOL is a high resolution low-cost technique of lithography that is able to pattern features beyond the diffraction limit of light. Due to its use of th...
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| Language: | en |
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University of Canterbury. Electrical and Computer Engineering
2008
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| Online Access: | http://hdl.handle.net/10092/1161 |