Development of Modelling Techniques for Pulsed Pressure Chemical Vapour Deposition (PP-CVD)
In this thesis, a numerical and theoretical investigation of the Pulsed Pressure Chemical Vapour Deposition (PP-CVD) progress is presented. This process is a novel method for the deposition of thin films of materials from either liquid or gaseous precursors. PP-CVD operates in an unsteady manner whe...
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| Language: | en |
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University of Canterbury. Mechanical Engineering
2008
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| Online Access: | http://hdl.handle.net/10092/1572 |