Three-Dimensional Patterning Using Ultraviolet Curable Nanoimprint Lithography.
Although a large number of works on nanoimprint lithography (NIL) techniques have been reported, the the ability for three-dimensional (3-D) patterning using NIL has not been fully addressed in terms of the mold fabrication and imprint processes. Patterning 3-D and multilevel features are important...
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| Language: | en |
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University of Canterbury. Electrical and Computer Engineering
2009
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| Online Access: | http://hdl.handle.net/10092/3049 |