Evanescent near-field optical lithography : overcoming the diffraction limit.
Concepts of optical resolution limits have been transformed in the past two decades with the development of near-field optical microscopy. Resolutions of λ/40 have been demonstrated by taking advantage of additional information present the near field of an object. These resolutions are far higher th...
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| Language: | en |
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University of Canterbury. Electrical and Electronic Engineering
2012
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| Online Access: | http://hdl.handle.net/10092/6655 |