Local study of ultrathin SiO2/Si for nanoelectronics by scanning probe microscopy.

Local study of ultrathin SiO2/Si for nanoelectronics by scanning probe microscopy.

Xue Kun. === "July 2005." === Thesis (Ph.D.)--Chinese University of Hong Kong, 2005. === Includes bibliographical references. === Electronic reproduction. Hong Kong : Chinese University of Hong Kong, [2012] System requirements: Adobe Acrobat Reader. Available via World Wide Web. === Abstra...

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Bibliographic Details
Other Authors: Xue, Kun.
Format: Others
Language:English
Chinese
Published: 2005
Subjects:
Molecular electronics
Nanotechnology
Scanning probe microscopy
Silica > Electric properties
Silicon oxide films
Online Access:http://library.cuhk.edu.hk/record=b6074031
http://repository.lib.cuhk.edu.hk/en/item/cuhk-343660

Internet

http://library.cuhk.edu.hk/record=b6074031
http://repository.lib.cuhk.edu.hk/en/item/cuhk-343660

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