Local study of ultrathin SiO2/Si for nanoelectronics by scanning probe microscopy.

Local study of ultrathin SiO2/Si for nanoelectronics by scanning probe microscopy.

Xue Kun. === "July 2005." === Thesis (Ph.D.)--Chinese University of Hong Kong, 2005. === Includes bibliographical references. === Electronic reproduction. Hong Kong : Chinese University of Hong Kong, [2012] System requirements: Adobe Acrobat Reader. Available via World Wide Web. === Abstra...

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Bibliographic Details
Other Authors: Xue, Kun.
Format: Others
Language:English
Chinese
Published: 2005
Subjects:
Molecular electronics
Nanotechnology
Scanning probe microscopy
Silica > Electric properties
Silicon oxide films
Online Access:http://library.cuhk.edu.hk/record=b6074031
http://repository.lib.cuhk.edu.hk/en/item/cuhk-343660
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spelling ndltd-cuhk.edu.hk-oai-cuhk-dr-cuhk_3436602019-02-19T03:41:28Z Local study of ultrathin SiO2/Si for nanoelectronics by scanning probe microscopy. CUHK electronic theses & dissertations collection Molecular electronics Nanotechnology Scanning probe microscopy Silica--Electric properties Silicon oxide films Xue Kun. "July 2005." Thesis (Ph.D.)--Chinese University of Hong Kong, 2005. Includes bibliographical references. Electronic reproduction. Hong Kong : Chinese University of Hong Kong, [2012] System requirements: Adobe Acrobat Reader. Available via World Wide Web. Abstract in English and Chinese. Xue, Kun. Chinese University of Hong Kong Graduate School. Division of Electronic Engineering. 2005 Text theses electronic resource microform microfiche 1 online resource (xiii, 267 p. : ill.) cuhk:343660 http://library.cuhk.edu.hk/record=b6074031 eng chi Use of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/) http://repository.lib.cuhk.edu.hk/en/islandora/object/cuhk%3A343660/datastream/TN/view/Local%20study%20of%20ultrathin%20SiO2/Si%20for%20nanoelectronics%20by%20scanning%20probe%20microscopy.jpghttp://repository.lib.cuhk.edu.hk/en/item/cuhk-343660
collection NDLTD
language English
Chinese
format Others
sources NDLTD
topic Molecular electronics
Nanotechnology
Scanning probe microscopy
Silica--Electric properties
Silicon oxide films
spellingShingle Molecular electronics
Nanotechnology
Scanning probe microscopy
Silica--Electric properties
Silicon oxide films
Local study of ultrathin SiO2/Si for nanoelectronics by scanning probe microscopy.
description Xue Kun. === "July 2005." === Thesis (Ph.D.)--Chinese University of Hong Kong, 2005. === Includes bibliographical references. === Electronic reproduction. Hong Kong : Chinese University of Hong Kong, [2012] System requirements: Adobe Acrobat Reader. Available via World Wide Web. === Abstract in English and Chinese.
author2 Xue, Kun.
author_facet Xue, Kun.
title Local study of ultrathin SiO2/Si for nanoelectronics by scanning probe microscopy.
title_short Local study of ultrathin SiO2/Si for nanoelectronics by scanning probe microscopy.
title_full Local study of ultrathin SiO2/Si for nanoelectronics by scanning probe microscopy.
title_fullStr Local study of ultrathin SiO2/Si for nanoelectronics by scanning probe microscopy.
title_full_unstemmed Local study of ultrathin SiO2/Si for nanoelectronics by scanning probe microscopy.
title_sort local study of ultrathin sio2/si for nanoelectronics by scanning probe microscopy.
publishDate 2005
url http://library.cuhk.edu.hk/record=b6074031
http://repository.lib.cuhk.edu.hk/en/item/cuhk-343660
_version_ 1718977877049868288

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