Epitaxial growth of 4H-SiC and characterization of deep levels for bipolar power devices
Kyoto University (京都大学) === 0048 === 新制・課程博士 === 博士(工学) === 甲第13015号 === 工博第2757号 === 新制||工||1401(附属図書館) === UT51-2007-H288 === 京都大学大学院工学研究科電子工学専攻 === (主査)教授 木本 恒暢, 教授 野田 進, 教授 藤田 静雄 === 学位規則第4条第1項該当...
Main Author: | Danno, Katsunori |
---|---|
Other Authors: | 木本, 恒暢 |
Format: | Others |
Language: | English |
Published: |
京都大学 (Kyoto University)
2011
|
Subjects: | |
Online Access: | http://hdl.handle.net/2433/136192 |
Similar Items
-
Ion implantation and embedded epitaxial growth for 4H-SiC power electronic devices
by: Negoro, Yuki
Published: (2011) -
EPITAXIAL GROWTH OF SiC BY CHEMICAL VAPOR DEPOSITION AND APPLICATION TO ELECTRONIC DEVICES
by: Shibahara, Kentaro
Published: (2012) -
Step-Controlled Epitaxial Growth of α-Sic and Device Applications
by: Kimoto, Tsunenobu
Published: (2009) -
Heteroepitaxial Growth of High-Quality AIN on SiC by Molecular-Beam Epitaxy toward Electronic Device Application
by: Onojima, Norio
Published: (2009) -
Epitaxial Growth and Characterization of SiC for High Power Devices
by: ul Hassan, Jawad
Published: (2009)