The impact of process variables on the chemical vapour deposition of silicon carbide

The impact of process variables on the chemical vapour deposition of silicon carbide

High temperature gas cooled nuclear reactors often make use of Tristructural Isotropic (TRISO) coated fuel particles. In these particles, a layer of silicon carbide plays the key role of providing mechanical strength and acting as a diffusion barrier so preventing the release of fission products. TR...

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Bibliographic Details
Main Author: Cromarty, Robert Douglas
Other Authors: De Villiers, Johan Pieter
Language:Eng
Published: University of Pretoria 2013
Subjects:
Methyltrichlorosilane
Triso
Spouted bed
Chemical vapor deposition
Free silicon mechanical properties
Deposition efficiency
Deposition rate
Morphology
Silicon carbide
UCTD
Online Access:http://hdl.handle.net/2263/31597
Cromarty, R.D. 2012, The impact of process variables on the chemical vapour deposition of silicon carbide, PhD thesis, University of Pretoria, Pretoria, viewed yymmdd <http://hdl.handle.net/2263/31597>

Internet

http://hdl.handle.net/2263/31597
Cromarty, R.D. 2012, The impact of process variables on the chemical vapour deposition of silicon carbide, PhD thesis, University of Pretoria, Pretoria, viewed yymmdd <http://hdl.handle.net/2263/31597>

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