Low temperature growth of Amorphous Silicon thin film

Low temperature growth of Amorphous Silicon thin film

Show other versions (2)

Magister Scientiae - MSc === The growth of amorphous hydrogenated silicon (a-Si:H) thin films deposided by hot wire chemical vapor deposition (HWCVD) has been studied. The films have been characterised for optical and structural properties by means of UV/VIS,FITR,ERDA, XRD.XTEM and Raman spectroscop...

Full description

Bibliographic Details
Main Author: Malape, Maibi Aaron
Other Authors: Knoesen, D.
Language:en
Published: University of the Western Cape 2013
Subjects:
Silicon
Semiconductors
Thin Films
Online Access:http://hdl.handle.net/11394/2272

Internet

http://hdl.handle.net/11394/2272

Similar Items