Low temperature growth of Amorphous Silicon thin film

Low temperature growth of Amorphous Silicon thin film

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Magister Scientiae - MSc === The growth of amorphous hydrogenated silicon (a-Si:H) thin films deposided by hot wire chemical vapor deposition (HWCVD) has been studied. The films have been characterised for optical and structural properties by means of UV/VIS,FITR,ERDA, XRD.XTEM and Raman spectroscop...

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Bibliographic Details
Main Author:	Malape, Maibi Aaron
Other Authors:	Knoesen, D.
Language:	en
Published:	University of the Western Cape 2013
Subjects:	Silicon Semiconductors Thin Films
Online Access:	http://hdl.handle.net/11394/2272

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