Studium nízkotlakého systému HCPJ pro depozici tenkých vrstev Ti02

• Main Author: Perekrestov, Roman
• Other Authors: Kudrna, Pavel
• Format: Doctoral Thesis
• Language: English
• Published: 2016
• Online Access: http://www.nusl.cz/ntk/nusl-348937

Title: The investigation of low pressure HCPJ system for TiO2 film deposition Author: Mgr. Roman Perekrestov Department / Institute: Department of Surface and Plasma Science Supervisor of the doctoral thesis: doc. Mgr. Pavel Kudrna, Dr. Abstract: Plasma sources are widely used for deposition of thin films for both commercial solutions as well as for research purposes. In particular, information about plasma parameters in such systems is of a great importance not only to ensure reproducibility, but also for the targeted influence on properties of deposited thin films. The aim of the dissertation was the study of plasma parameters with respect to the growth and properties of thin films deposited by means of HCPJ sputtering system. The investigated plasma system was plasma jet powered in DC mode. The diagnostics of the discharge was carried out by means of a cylindrical Langmuir probe, quadrupole mass and optical spectrometer. Neutral gas temperature in discharge was measured by an optic-fibre thermometer. The growth of nanoparticles in a gas phase was studied using scattering of laser beam light. For the diagnostics of Ti/TiO2 thin films were used XPS, SEM, AFM, TEM, XRD and EDX methods. The photovoltaic performance of TiO2 thin films was tasted in dye-sensitized solar cells. Keywords: plasma jet, Langmuir...