Aplikace surfatronového výboje v plazmochemických aplikacích
This diploma thesis deals utilization of plasma {--} chemical reactions in technological applications, mainly at deposition of thin films and their sequential diagnostics. Introduction describes basis of theoretic aspects of plasma physics. There are discussed relations between temperature, pressure...
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Format: | Dissertation |
Language: | Czech |
Published: |
2008
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Online Access: | http://www.nusl.cz/ntk/nusl-48723 |