Algorithmic techniques for nanometer VLSI design and manufacturing closure

As Very Large Scale Integration (VLSI) technology moves to the nanoscale regime, design and manufacturing closure becomes very difficult to achieve due to increasing chip and power density. Imperfections due to process, voltage and temperature variations aggravate the problem. Uncertainty in electri...

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Bibliographic Details
Main Author: Hu, Shiyan
Other Authors: Hu, Jiang
Format: Others
Language:en_US
Published: Texas A&M University 2008
Subjects:
Online Access:http://hdl.handle.net/1969.1/85905