Nanocrystals Embedded Zirconium-doped Hafnium Oxide High-k Gate Dielectric Films

Nanocrystals Embedded Zirconium-doped Hafnium Oxide High-k Gate Dielectric Films

Nanocrystals embedded zirconium-doped hafnium oxide (ZrHfO) high-k gate dielectric films have been studied for the applications of the future metal oxide semiconductor field effect transistor (MOSFET) and nonvolatile memory. ZrHfO has excellent gate dielectric properties and can be prepared into MOS...

Full description

Bibliographic Details
Main Author: Lin, Chen-Han
Other Authors: Kuo, Yue
Format: Others
Language:en_US
Published: 2012
Subjects:
High-k
Hafnium Oxide
Nonvolatile
Memory
MOSFET
Online Access:http://hdl.handle.net/1969.1/ETD-TAMU-2011-08-9884

Internet

http://hdl.handle.net/1969.1/ETD-TAMU-2011-08-9884

Similar Items