Selectivity Failure in the Chemical Vapor Deposition of Tungsten
Tungsten metal is used as an electrical conductor in many modern microelectronic devices. One of the primary motivations for its use is that it can be deposited in thin films by chemical vapor deposition (CVD). CVD is a process whereby a thin film is deposited on a solid substrate by the reaction of...
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| Format: | Others |
| Language: | English |
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University of North Texas
1994
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| Online Access: | https://digital.library.unt.edu/ark:/67531/metadc277954/ |