Functionalization and characterization of porous low-κ dielectrics.
The incorporation of fluorine into SiO2 has been shown to reduce the dielectric constant of the existing materials by reducing the electrical polarizability. However, the incorporation of fluorine has also been shown to decrease film stability. Therefore, new efforts have been made to find different...
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| Format: | Others |
| Language: | English |
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University of North Texas
2005
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| Online Access: | https://digital.library.unt.edu/ark:/67531/metadc5570/ |