Sputtering of Bi and Preferential Sputtering of an Inhomogeneous Alloy
Angular distributions and total yields of atoms sputtered from bismuth targets by normally incident 10 keV -50 keV Ne+ and Ar+ ions have been measured both experimentally and by computer simulation. Polycrystalline Bi targets were used for experimental measurements. The sputtered atoms were collecte...
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| Format: | Others |
| Language: | English |
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University of North Texas
2014
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| Online Access: | https://digital.library.unt.edu/ark:/67531/metadc700021/ |