Plasma Interactions on Organosilicate Glass Dielectric Films and Emerging Amorphous Materials- Approach to Pore Sealing and Chemical Modifications

In-situ x-ray photoemission (XPS) and ex-situ FTIR studies of nanoporous organosilicate glass (OSG) films point to the separate roles of radicals vs. VUV photons in the carbon abstraction. The studies indicate that reaction with O2 in presence of VUV photons (~123 nm) result in significant carbon ab...

Full description

Bibliographic Details
Main Author: Kazi, Haseeb
Other Authors: Kelber, Jeffry Alan, 1952-
Format: Others
Language:English
Published: University of North Texas 2015
Subjects:
Online Access:https://digital.library.unt.edu/ark:/67531/metadc801876/