Boron Nitride by Atomic Layer Deposition: A Template for Graphene Growth

• Main Author: Zhou, Mi
• Other Authors: Kelber, Jeffery A.
• Format: Others
• Language: English
• Published: University of North Texas 2011
• Subjects: Atomic layer deposition; boron nitride; grapheme; ALD
• Online Access: https://digital.library.unt.edu/ark:/67531/metadc84305/

The growth of single and multilayer BN films on several substrates was investigated. A typical atomic layer deposition (ALD) process was demonstrated on Si(111) substrate with a growth rate of 1.1 Å/cycle which showed good agreement with the literature value and a near stoichiometric B/N ratio. Boron nitride films were also deposited by ALD on Cu poly crystal and Cu(111) single crystal substrates for the first time, and a growth rate of ~1ML/ALD cycle was obtained with a B/N ratio of ~2. The realization of a h-BN/Cu heterojunction was the first step towards a graphene/h-BN/Cu structure which has potential application in gateable interconnects.