Aufbau einer Interferenzlithografie-Anlage zur Herstellung photonischer Kristalle

Multiple laser beam interference allows to produce periodic light patterns in the order of the wavelength of light. A simulation program helps to identify different patterns and to investigate the influence of changing parameters such as e.g. the angle of incidence or the polarization. A positive ph...

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Bibliographic Details
Main Author:	Mellert, Karolin
Other Authors:	Applied optics
Format:	Others
Language:	de
Published:	Rheinische Friedrich-Wilhelms-Universität Bonn 2016
Subjects:	photonic crystal interference lithography simulation metal gold plasmon S1805 Shipley positive photoresist QC
Online Access:	http://hdl.handle.net/10919/71551

id	ndltd-vtechworks.lib.vt.edu-oai-vtechworks.lib.vt.edu-10919-71551
record_format	oai_dc
spelling	ndltd-vtechworks.lib.vt.edu-oai-vtechworks.lib.vt.edu-10919-715512020-10-03T06:13:30Z Aufbau einer Interferenzlithografie-Anlage zur Herstellung photonischer Kristalle Mellert, Karolin Applied optics photonic crystal interference lithography simulation metal gold plasmon S1805 Shipley positive photoresist QC Multiple laser beam interference allows to produce periodic light patterns in the order of the wavelength of light. A simulation program helps to identify different patterns and to investigate the influence of changing parameters such as e.g. the angle of incidence or the polarization. A positive photoresist (Shipley S1805) is used to create two-dimensional metallic photonic crystals by UV interference lithography. 2016-06-27T19:03:40Z 2016-06-27T19:03:40Z 2002-12 Thesis eprint:275 http://hdl.handle.net/10919/71551 de In Copyright http://rightsstatements.org/vocab/InC/1.0/ application/pdf application/pdf Rheinische Friedrich-Wilhelms-Universität Bonn
collection	NDLTD
language	de
format	Others
sources	NDLTD
topic	photonic crystal interference lithography simulation metal gold plasmon S1805 Shipley positive photoresist QC
spellingShingle	photonic crystal interference lithography simulation metal gold plasmon S1805 Shipley positive photoresist QC Mellert, Karolin Aufbau einer Interferenzlithografie-Anlage zur Herstellung photonischer Kristalle
description	Multiple laser beam interference allows to produce periodic light patterns in the order of the wavelength of light. A simulation program helps to identify different patterns and to investigate the influence of changing parameters such as e.g. the angle of incidence or the polarization. A positive photoresist (Shipley S1805) is used to create two-dimensional metallic photonic crystals by UV interference lithography.
author2	Applied optics
author_facet	Applied optics Mellert, Karolin
author	Mellert, Karolin
author_sort	Mellert, Karolin
title	Aufbau einer Interferenzlithografie-Anlage zur Herstellung photonischer Kristalle
title_short	Aufbau einer Interferenzlithografie-Anlage zur Herstellung photonischer Kristalle
title_full	Aufbau einer Interferenzlithografie-Anlage zur Herstellung photonischer Kristalle
title_fullStr	Aufbau einer Interferenzlithografie-Anlage zur Herstellung photonischer Kristalle
title_full_unstemmed	Aufbau einer Interferenzlithografie-Anlage zur Herstellung photonischer Kristalle
title_sort	aufbau einer interferenzlithografie-anlage zur herstellung photonischer kristalle
publisher	Rheinische Friedrich-Wilhelms-Universität Bonn
publishDate	2016
url	http://hdl.handle.net/10919/71551
work_keys_str_mv	AT mellertkarolin aufbaueinerinterferenzlithografieanlagezurherstellungphotonischerkristalle
_version_	1719347515401175040

Aufbau einer Interferenzlithografie-Anlage zur Herstellung photonischer Kristalle

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