Fabrication of Flexible Au/ZnO/ITO/PET Memristor Using Dilute Electrodeposition Method

DRAM has been approaching its maximum physical limit due to the demand of smaller size and higher capacity memory resistor. The researchers have discovered the abilities of a memristor, a Non Volatile Memory (NVM) that could overcome the size and capacity obstacles. This paper discussed about the de...

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Main Authors: Ani, M.H (Author), Azhar, A.Z.A (Author), Fauzi, F.B (Author), Herman S.H (Author), Herman, S.H (Author), Mohamed, M.A (Author), Othman, R. (Author)
Format: Article
Language:English
Published: Institute of Physics Publishing 2015
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020 |a 17578981 (ISSN) 
245 1 0 |a Fabrication of Flexible Au/ZnO/ITO/PET Memristor Using Dilute Electrodeposition Method 
260 0 |b Institute of Physics Publishing  |c 2015 
856 |z View Fulltext in Publisher  |u https://doi.org/10.1088/1757-899X/99/1/012002 
856 |z View in Scopus  |u https://www.scopus.com/inward/record.uri?eid=2-s2.0-84960865692&doi=10.1088%2f1757-899X%2f99%2f1%2f012002&partnerID=40&md5=bc97d3d7319cd2f978e648b4121c0a23 
520 3 |a DRAM has been approaching its maximum physical limit due to the demand of smaller size and higher capacity memory resistor. The researchers have discovered the abilities of a memristor, a Non Volatile Memory (NVM) that could overcome the size and capacity obstacles. This paper discussed about the deposition of zinc oxide (ZnO) on indium tin oxide (ITO) coated polyethylene terephthalate (PET) substrate by electrodeposition. Metallic Zn film was deposited on substrates with varying deposition time from 15 to 120 seconds in very dilute zinc chloride (ZnCl2) aqueous and subsequently oxidized at 150 °C to form ZnO/ITO coated PET junction. The deposited thin film was characterized via x-ray diffraction (XRD) and field emission scanning electron microscopy (FESEM). The results from I-V measurement show the deposited ZnO exhibits pinched hysteresis loop. The hysteresis loop becomes smaller with increasing deposition time. The 15 seconds electrodeposition gave the largest hysteresis loop and largest value of resistive switching ratio of 1.067. The result of the synthesized ZnO on the flexible substrate can be one of the alternatives to replace the current memory system as the flexible memory system. © Published under licence by IOP Publishing Ltd. 
650 0 4 |a Data storage equipment 
650 0 4 |a Deposition 
650 0 4 |a Digital storage 
650 0 4 |a Dynamic random access storage 
650 0 4 |a Electrodeposition 
650 0 4 |a Electrodeposition methods 
650 0 4 |a Electrodes 
650 0 4 |a Electronic equipment 
650 0 4 |a Field emission microscopes 
650 0 4 |a Field emission scanning electron microscopy 
650 0 4 |a Flexible substrate 
650 0 4 |a Hysteresis 
650 0 4 |a Hysteresis loops 
650 0 4 |a Indium tin oxide 
650 0 4 |a I-V measurements 
650 0 4 |a Memristors 
650 0 4 |a Non-volatile memory 
650 0 4 |a Passive filters 
650 0 4 |a Plastic bottles 
650 0 4 |a Polyethylene terephthalates (PET) 
650 0 4 |a Resistive switching 
650 0 4 |a Scanning electron microscopy 
650 0 4 |a Substrates 
650 0 4 |a Thermoelectric equipment 
650 0 4 |a Tin oxides 
650 0 4 |a X ray diffraction 
650 0 4 |a Zinc 
650 0 4 |a Zinc chloride 
650 0 4 |a Zinc oxide 
700 1 0 |a Ani, M.H.  |e author 
700 1 0 |a Azhar, A.Z.A.  |e author 
700 1 0 |a Fauzi, F.B.  |e author 
700 1 0 |a Herman S.H.  |e author 
700 1 0 |a Herman, S.H.  |e author 
700 1 0 |a Mohamed, M.A.  |e author 
700 1 0 |a Othman, R.  |e author