Use of the ultraviolet absorption spectrum of CF2 to determine the spatially resolved absolute CF2 density, rotational temperature, and vibrational distribution in a plasma etching reactor
Broadband ultraviolet absorption spectroscopy has been used to determine CF2 densities in a plasma etch reactor used for industrial wafer processing, using the CF2 Ã 1B1 ? X 1A1 absorption spectrum. Attempts to fit the experimental spectra using previously published Franck-Condon factors gave poor...
| Main Authors: | , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
2004-05-22.
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| Subjects: | |
| Online Access: | Get fulltext |