Use of the ultraviolet absorption spectrum of CF2 to determine the spatially resolved absolute CF2 density, rotational temperature, and vibrational distribution in a plasma etching reactor
Broadband ultraviolet absorption spectroscopy has been used to determine CF2 densities in a plasma etch reactor used for industrial wafer processing, using the CF2 Ã 1B1 ? X 1A1 absorption spectrum. Attempts to fit the experimental spectra using previously published Franck-Condon factors gave poor...
Main Authors: | Bulcourt, Nicholas (Author), Booth, Jean-Paul (Author), Hudson, Eric A. (Author), Luque, Jorge (Author), Mok, Daniel K.W (Author), Lee, Edmond P. (Author), Chau, Foo-Tim (Author), Dyke, John M. (Author) |
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Format: | Article |
Language: | English |
Published: |
2004-05-22.
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Subjects: | |
Online Access: | Get fulltext |
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