Gateable suppression of spin relaxation in semiconductor FETs

The decay of spin memory in a 2D electron gas is found to be suppressed close to the metal-insulator transition. By dynamically probing the device using ultrafast spectroscopy, relaxation of optically excited electron spin is directly measured as a function of the carrier density. Motional narrowing...

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Bibliographic Details
Main Authors: Sandhu, J.S (Author), Heberle, A.P (Author), Baumberg, J.J (Author), Cleaver, J.R.A (Author)
Format: Article
Language:English
Published: 2001-03.
Subjects:
Online Access:Get fulltext
LEADER 00968 am a22001573u 4500
001 256694
042 |a dc 
100 1 0 |a Sandhu, J.S.  |e author 
700 1 0 |a Heberle, A.P.  |e author 
700 1 0 |a Baumberg, J.J.  |e author 
700 1 0 |a Cleaver, J.R.A.  |e author 
245 0 0 |a Gateable suppression of spin relaxation in semiconductor FETs 
260 |c 2001-03. 
856 |z Get fulltext  |u https://eprints.soton.ac.uk/256694/1/PRL01_gatedspin.pdf 
520 |a The decay of spin memory in a 2D electron gas is found to be suppressed close to the metal-insulator transition. By dynamically probing the device using ultrafast spectroscopy, relaxation of optically excited electron spin is directly measured as a function of the carrier density. Motional narrowing favors spin preservation in the maximally scattered but nonlocalized electronic states. This implies that the spin-relaxation rate can be both tuned in situ and specifically engineered in appropriate device geometries. 
655 7 |a Article