Increased lateral crystallization width during nickel induced lateral crystallization of amorphous silicon using fluorine implantation
This paper reports a study of the effect of fluorine implantation on the nickel-induced lateral crystallization of amorphous silicon. To distinguish the effects of the fluorine and the implantation damage, the fluorine implant is either made directly into the a-Si or into the buffer oxide below the...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
2007-08.
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| Subjects: | |
| Online Access: | Get fulltext |