Nanoimprint lithography for planar chiral photonic meta-materials
Room temperature nanoimprint lithography has successfully been applied to the fabrication of planar chiral photonic meta-materials. For dielectric chiral structures a single layer of thick HSQ was used while for metallic chiral structures a bi-layer technique using PMMA/hydrogen silsequioxane (HSQ)...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
2005-01-11.
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| Subjects: | |
| Online Access: | Get fulltext |