Nanoimprint lithography for planar chiral photonic meta-materials
Room temperature nanoimprint lithography has successfully been applied to the fabrication of planar chiral photonic meta-materials. For dielectric chiral structures a single layer of thick HSQ was used while for metallic chiral structures a bi-layer technique using PMMA/hydrogen silsequioxane (HSQ)...
Main Authors: | Chen, Yifang (Author), Tao, Jiarui (Author), Zhao, Xinghong (Author), Cui, Zheng (Author), Schwanecke, Alexander S. (Author), Zheludev, Nikolay I. (Author) |
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Format: | Article |
Language: | English |
Published: |
2005-01-11.
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Subjects: | |
Online Access: | Get fulltext |
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