Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications
This paper describes a systematic approach to analyze the simultaneous impact of various reactant plasma parameters of remote plasma enhanced ALD (PEALD) on the ZnO thin film properties. Particular emphasis is placed on the film stoichiometry which affects the electrical properties of the thin film....
| Main Authors: | , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
2012-09.
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| Subjects: | |
| Online Access: | Get fulltext |