Three-dimensional control of optical waveguide fabrication in silicon
In this paper, we report a direct-write technique for three dimensional control of waveguide fabrication in silicon. Here, a focused beam of 250 keV protons is used to selectively slow down the rate of porous silicon formation during subsequent anodization, producing a silicon core surrounded by por...
| Main Authors: | , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
2008-01-21.
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| Subjects: | |
| Online Access: | Get fulltext |