Hot-wire polysilicon waveguides with low deposition temperature
We fabricated and measured the optical loss of polysilicon waveguides deposited using Hot-Wire Chemical Vapour Deposition (HWCVD) at a temperature of 240°C. A polysilicon film 220 nm thick was deposited on top of a 2000 nm thick PECVD silicon dioxide. The crystalline volume fraction of the polysilic...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
2013.
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| Subjects: | |
| Online Access: | Get fulltext |