Fabrication and characterization of camphor-based amorphous carbon thin films
Pure amorphous carbon (a-C) and nitrogen doped amorphous carbon (a-C: N) thin films were prepared using Thermal Chemical Vapor Deposition (CVD) with deposition temperature ranging from 500 degrees C to 650 degrees C using camphor (C10H16O) as a precursor from natural source. The physical and optical...
| Main Authors: | , , |
|---|---|
| Format: | Article |
| Language: | English |
| Online Access: | View Fulltext in Publisher |