Surface Modification of Electroosmotic Silicon Microchannel Using Thermal Dry Oxidation

A simple fabrication method for the surface modification of an electroosmotic silicon microchannel using thermal dry oxidation is presented. The surface modification is done by coating the silicon surface with a silicon dioxide (SiO2) layer using a thermal oxidation process. The process aims not onl...

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Bibliographic Details
Main Authors: Hamzah, AA (Author), Latif, R (Author), Majlis, BY (Author), Wee, MFMR (Author), Yaakub, TNT (Author), Yunas, J (Author)
Format: Article
Language:English
Published: 2018
Subjects:
Online Access:View Fulltext in Publisher