Optical Properties of Sputtered Tantalum Nitride Films Determined by Spectroscopic Ellipsometry

by Waechtler, Thomas, Gruska, Bernd, Zimmermann, Sven, Schulz, Stefan E., Gessner, Thomas
Published 2006

Characterization of Sputtered Ta and TaN Films by Spectroscopic Ellipsometry

by Waechtler, Thomas, Gruska, Bernd, Zimmermann, Sven, Schulz, Stefan E., Gessner, Thomas
Published 2007

Characterization of Sputtered Ta and TaN Films by Spectroscopic Ellipsometry

by Waechtler, Thomas, Gruska, Bernd, Zimmermann, Sven, Schulz, Stefan E., Gessner, Thomas
Published 2007

Optical Properties of Sputtered Tantalum Nitride Films Determined by Spectroscopic Ellipsometry

by Waechtler, Thomas, Gruska, Bernd, Zimmermann, Sven, Schulz, Stefan E., Gessner, Thomas
Published 2006

ALD of Copper and Copper Oxide Thin Films For Applications in Metallization Systems of ULSI Devices

by Waechtler, Thomas, Oswald, Steffen, Roth, Nina, Lang, Heinrich, Schulz, Stefan E., Gessner, Thomas
Published 2008

In-situ XPS Investigation of the Surface Chemistry of a Cu(I) Beta-Diketonate Precursor and the ALD of Cu2O

by Dhakal, Dileep, Waechtler, Thomas, E. Schulz, Stefan, Mothes, Robert, Lang, Heinrich, Gessner, Thomas
Published 2014

ALD of Copper and Copper Oxide Thin Films For Applications in Metallization Systems of ULSI Devices

by Waechtler, Thomas, Oswald, Steffen, Roth, Nina, Lang, Heinrich, Schulz, Stefan E., Gessner, Thomas
Published 2008

In-situ XPS Investigation of ALD Cu2O and Cu Thin Films after Successive Reduction

by Dhakal, Dileep, Waechtler, Thomas, E. Schulz, Stefan, Mothes, Robert, Moeckel, Stefan, Lang, Heinrich, Gessner, Thomas
Published 2014

Surface chemistry of a Cu(I) beta-diketonate precursor and the atomic layer deposition of Cu2O on SiO2 studied by x-ray photoelectron spectroscopy

by Dhakal, Dileep, Waechtler, Thomas, E. Schulz, Stefan, Gessner, Thomas, Lang, Heinrich, Mothes, Robert, Tuchscherer, Andre
Published 2014

Copper Oxide ALD from a Cu(I) <beta>-Diketonate: Detailed Growth Studies on SiO2 and TaN

by Waechtler, Thomas, Roth, Nina, Mothes, Robert, Schulze, Steffen, Schulz, Stefan E., Gessner, Thomas, Lang, Heinrich, Hietschold, Michael
Published 2009

Copper Oxide ALD from a Cu(I) <beta>-Diketonate: Detailed Growth Studies on SiO2 and TaN

by Waechtler, Thomas, Roth, Nina, Mothes, Robert, Schulze, Steffen, Schulz, Stefan E., Gessner, Thomas, Lang, Heinrich, Hietschold, Michael
Published 2009

Detailed Study of Copper Oxide ALD on SiO2, TaN, and Ru

by Waechtler, Thomas, Schulze, Steffen, Hofmann, Lutz, Hermann, Sascha, Roth, Nina, Schulz, Stefan E., Gessner, Thomas, Lang, Heinrich, Hietschold, Michael
Published 2009

Detailed Study of Copper Oxide ALD on SiO2, TaN, and Ru

by Waechtler, Thomas, Schulze, Steffen, Hofmann, Lutz, Hermann, Sascha, Roth, Nina, Schulz, Stefan E., Gessner, Thomas, Lang, Heinrich, Hietschold, Michael
Published 2009

Copper Oxide Films Grown by Atomic Layer Deposition from Bis(tri-n-butylphosphane)copper(I)acetylacetonate on Ta, TaN, Ru, and SiO2

by Waechtler, Thomas, Oswald, Steffen, Roth, Nina, Jakob, Alexander, Lang, Heinrich, Ecke, Ramona, Schulz, Stefan E., Gessner, Thomas, Moskvinova, Anastasia, Schulze, Steffen, Hietschold, Michael
Published 2009

Copper Oxide Films Grown by Atomic Layer Deposition from Bis(tri-n-butylphosphane)copper(I)acetylacetonate on Ta, TaN, Ru, and SiO2

by Waechtler, Thomas, Oswald, Steffen, Roth, Nina, Jakob, Alexander, Lang, Heinrich, Ecke, Ramona, Schulz, Stefan E., Gessner, Thomas, Moskvinova, Anastasia, Schulze, Steffen, Hietschold, Michael
Published 2009

ALD-grown seed layers for electrochemical copper deposition integrated with different diffusion barrier systems

by Waechtler, Thomas, Ding, Shao-Feng, Hofmann, Lutz, Mothes, Robert, Xie, Qi, Oswald, Steffen, Detavernier, Christophe, Schulz, Stefan E., Qu, Xin-Ping, Lang, Heinrich, Gessner, Thomas
Published 2011

Profillinie 3: Mikroelektronik und Mikrosystemtechnik

by Geßner, Thomas, Schulz, Stefan E., Hiller, Karla, Otto, Thomas, Radehaus, Christian, Dötzel, Wolfram, Müller, Dietmar, Löbner, Bernd, Wanielik, Gerd, Neubert, Ulrich, Lutz, Josef, Lang, Heinrich
Published 2005

Profillinie 3: Mikroelektronik und Mikrosystemtechnik:

by Geßner, Thomas, Schulz, Stefan E., Hiller, Karla, Otto, Thomas, Radehaus, Christian, Dötzel, Wolfram, Müller, Dietmar, Löbner, Bernd, Wanielik, Gerd, Neubert, Ulrich, Lutz, Josef, Lang, Heinrich
Published 2005

Evaluation of Phosphite and Phosphane Stabilized Copper(I) Trifluoroacetates as Precursors for the Metal-Organic Chemical Vapor Deposition of Copper

by Waechtler, Thomas, Shen, Yingzhong, Jakob, Alexander, Ecke, Ramona, Schulz, Stefan E., Wittenbecher, Lars, Sterzel, Hans-Josef, Tiefensee, Kristin, Oswald, Steffen, Schulze, Steffen, Lang, Heinrich, Hietschold, Michael, Gessner, Thomas
Published 2006

Evaluation of Phosphite and Phosphane Stabilized Copper(I) Trifluoroacetates as Precursors for the Metal-Organic Chemical Vapor Deposition of Copper

by Waechtler, Thomas, Shen, Yingzhong, Jakob, Alexander, Ecke, Ramona, Schulz, Stefan E., Wittenbecher, Lars, Sterzel, Hans-Josef, Tiefensee, Kristin, Oswald, Steffen, Schulze, Steffen, Lang, Heinrich, Hietschold, Michael, Gessner, Thomas
Published 2006