Novel process for SiO_2/Si selective etching using a novel gas source for preventing global warming

by Fujita, Kazushi, Ito, Masafumi, Hori, Masaru, Goto, Toshio
Published 1999

Control of seed layer for a low temperature formation of polycrystalline silicon with high crystallinity and a smooth surface

by Murata, Kazuya, Ito, Masafumi, Hori, Masaru, Goto, Toshio
Published 1999

Environmentally benign etching process of amorphous silicon and tungsten using species evaporated from polytetrafluoroethylene and fluorinated ethylene propylene

by Fujita, Kazushi, Hori, Masaru, Goto, Toshio, Ito, Masafumi
Published 2003

Silicon oxide contact hole etching employing an environmentally benign process

by Fujita, Kazushi, Hori, Masaru, Goto, Toshio, Ito, Masafumi
Published 2002

Spatial distribution of the absolute densities of CF_x radicals in fluorocarbon plasmas determined from single-path infrared laser absorption and laser-induced fluorescence

by Nakamura, Masayuki, Hori, Masaru, Goto, Toshio, Ito, Masafumi, Ishii, Nobuo
Published 2001

Surface reaction of CF_2 radicals for fluorocarbon film formation in SiO_2/Si selective etching process

by Inayoshi, Muneto, Ito, Masafumi, Hori, Masaru, Goto, Toshio, Hiramatsu, Mineo
Published 1998

Formation and micromachining of Teflon (fluorocarbon polymer) film by a completely dry process using synchrotron radiation

by Inayoshi, Muneto, Ito, Masafumi, Hori, Masaru, Goto, Toshio, Hiramatsu, Mineo
Published 1999

Formation of silicon nitride gate dielectric films at 300 ℃ employing radical chemical vapor deposition

by Ohta, Hiroyuki, Nagashima, Atsushi, Ito, Masafumi, Hori, Masaru, Goto, Toshio
Published 2000

Plasma diagnostics and low-temperature deposition of microcrystalline silicon films in ultrahigh-frequency silane

by Sumiya, Shigeaki, Mizutani, Yuko, Yoshida, Ryohei, Hori, Masaru, Goto, Toshio, Ito, Masafumi, Tsukada, Tsutomu, Samukawa, Seiji
Published 2000

HIV-1 nef suppression by virally encoded microRNA

by Brisibe Ebiamadon, Okuyama Harumi, Ichikawa Yuko, Tsutsumi Yutaka, Ito Masafumi, Omoto Shinya, Saksena Nitin K, Fujii Yoichi R
Published 2004-12-01