Synthesis and Solubility Study of the Polyamides Containing 4,4'-(9- fluorenylidene)dianiline in the Backbone as an Antireflecting Spin-on Hardmask Materials

by Irina Nam, Dong Seon Uh, Chang Il Oh, Jin Kuk Lee, Jae Min Oh, Jong Seob Kim
Published 2007-01-01

Dye-Containing Methacrylic Polymers in the Composition of Photo Resists for Complementary Metal Oxide Semiconductor Image Sensors

by E. J. Jeong, S. Motallebi, Jae-H. Kim, C. Lee, K. Lee, S. Maghsoodi, Jong-Seob Kim, Tu-W. Chang
Published 2009-09-01