Mitigating the Impact of Mask Absorber Error on Lithographic Performance by Lithography System Holistic Optimization
The non-ideal mask absorber can cause an increase in critical dimension error (CDE) and decrease in process window (PW). However, the random mask absorber errors induced during mask fabricating and measuring are not considered in computational lithography. The problem cannot be neglected as the cont...
| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2019-03-01
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| Series: | Applied Sciences |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2076-3417/9/7/1275 |